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Thin Solid Films 447 – 448 (2004) 153–157 Fabrication of silicon carbide thin films by plasma immersion ion implantation with self-ignited glow
(2006) DOI: 10.1111/j.1551-2916.2006.00891.x r 2005 The American Ceramic Society Production of Silicon Carbide Pieces by Immersion of Silicon Preforms
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Thin Solid Films 447 – 448 (2004) 153–157 Fabrication of silicon carbide thin films by plasma immersion ion implantation with self-ignited glow
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Individual CNT walls can be metallic or semiconducting depending on the orientation of the lattice with respect to the tube axis, which is called
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(2006) DOI: 10.1111/j.1551-2916.2006.00891.x r 2005 The American Ceramic Society Production of Silicon Carbide Pieces by Immersion of Silicon Preforms